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--- intro_wafer [2026/06/22 15:09] – [WG status] gauthier.roussilhe.ext
+++ intro_wafer [2026/07/07 19:53] (current) – [WG status] gauthier.roussilhe.ext
@@ Line 2: / Line 2: @@
 ## WG status
-This working group focuses on the life cycle inventory of semiconductor manufacturing. We look specifically at wafer and photomask manufacturing, front-end and back-end processes for logic and memory devices.
+This working group focuses on the life cycle inventory of semiconductor manufacturing. We look specifically at wafer and photomask manufacturing, front-end and back-end processes for logic and memory devices
+.
+### Tasks status
+| **WG tracks**           | **Reference contact** | **Priority** | **Status**      | **In process tasks**                                                             |
+| Front-end manufacturing | Gauthier              | High         | Validated       | Modelisation approach (v1)                                                       |
+|                         |                       | High             | Almost complete | Characterisation of inputs and outputs by process type                           |
+|                         |                       | High             | In progress     | Recovery of missing model parameters                                             |
+|                         |                       | High             | In progress     | Recovery of recipe archetype per device                                          |
+|                         |                       | High             | In progress     | Contacting manufacturers and laboratories to obtain average data by process type |
+| Back-end manufacturing  | Arthur                | High         | In progress     | To be filled by Arthur                                                           |
+| Wafer manufacturing     | Gauthier              | Medium       | In queue        | To be started by Matthieu                                                        |
+| Photomask manufacturing | Gauthier              | Low          | Not started     | To be started, dependant of photomask recovery for elemental analysis            |
-<table><thead><tr><th>**WG tracks**</th><th>**Reference contact**</th><th>**Priority**</th><th>**Status**</th><th>**In process tasks**</th></tr></thead><tbody><tr><td rowspan="5">Front-end manufacturing</td><td rowspan="5">Gauthier</td><td rowspan="5">High</td><td>Validated</td><td>Modelisation approach (v1)</td></tr><tr><td>Almost complete</td><td>Characterisation of inputs and outputs by process type</td></tr><tr><td>In progress</td><td>Recovery of missing model parameters</td></tr><tr><td>In progress</td><td>Recovery of recipe archetype per device</td></tr><tr><td>In progress</td><td>Contacting manufacturers and laboratories to obtain average data by process type</td></tr><tr><td>Back-end manufacturing</td><td>Arthur</td><td>High</td><td>In progress</td><td>To be filled by Arthur</td></tr><tr><td>Wafer manufacturing</td><td>Gauthier</td><td>Medium</td><td>In queue</td><td>To be started by Matthieu</td></tr>
-<tr><td>Photomask manufacturing</td><td>Gauthier</td><td>Low</td><td>Not started</td><td>To be started, dependant of photomask recovery for elemental analysis</td></tr></tbody></table>
 ### Members
@@ Line 16: / Line 27: @@
   * Olivier Soldano, Inria
   * Thibault Simon, Resilio
+  * Matthieu Elizalde, Evea
+  * William Voghel, CIRAIG
+## Important pages
+  * [Modelization strategy](modelization-strategy.md)
+  * [Front-end manufacturing concepts](fab-process-flow.md)
+  * [Front-end processes](front-end.md)
+  * [Back-end manufacturing concepts](back-process-flow.md)
+  * [Back-end processes](back-end.md)
+  * [3D NAND recipe use case](3dnand-case.md)
+  * [DRAM recipe use case](dram-case.md)