Complementary Metal-Oxide-Semiconductor (CMOS) Image Sensor (⚠️WORK IN PROGRESS⚠️)

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Complementary Metal-Oxide-Semiconductor (CMOS) Image Sensor

Definition

A CMOS sensor (Complementary Metal-Oxide-Semiconductor sensor) is an electronic image sensor that converts light into digital signals using the photodetector principle. Photons are captured and converted into electrons by the photodiode, which are then converted to voltage. An analog-to-digital converter (ADC) then converts this analog information to digital information, which is further processed to create the final image. This technology is used in most modern digital cameras, smartphones, webcams and many scientific imaging devices1).

Figure 1: CMOS working principle

Main components

Microlens

Color filter

Photodiode

It exists a lot of different types of photodiiode : n+/p-sub, n-well/p-sub, p+/n-well or p+/n-well/p-sub, pinned photodiode, buried photodiode, fully depleted pinned photodiode, vertical PIN, lateral PIN, deep-n-well PIN, spot PIN, stacked photodiodes, avalanche photodiodes, vertical color-separable PPDs, thin-film pinned photodiodes, and pinned photo-gates.

The most-used type of pohtodiiode for CMOS is the pinned photodiiode. 2)

CMOS vertical photodiiodes types

This figure illustrates three types of vertical photodiodes suitable for fabrication in standard N-well CMOS processes : photodiodes using the N-well/P-sub, P+/N-well, and N+/P-sub junctions.

https://www.mdpi.com/2079-9292/13/4/691#metrics
Figure 2: 3 types of photodiiode structure and 1 phototransistor 3)

The best type of junction depends on the CMOS structure 4) :

  • for 0.7 $\mu$m CMOS process : N+/P-sub
  • for 0.35 $\mu$m CMOS process : N-well/P-sub
  • for 0.18 $\mu$m CMOS process : P+/N-well

Potential well

Working Principle

Photodetector principle

This image shows how a photodector works. The photon penetrates the silicon and create a electron-hole pair connection. The photonic penetration depth on silicon, i.e., the light absorption, depends on the wavelength. This means that the longer the wavelength λ [m] of a photon, the loweris its energy, and the further it can delve into silicon. 5)

https://www.mdpi.com/2079-9292/13/4/691
Figure 3: Electon/hole PN jonction 6)

Silicon photodetectors can create photogenerated currents for impinging light with wavelengths across the complete visible range. The produced photocurrent is proportional to the intensity of the incident light and is given by : $$I_{ph} = \frac{e \times QE \times \lambda \times P_i}{hc} = \frac{e \times QE \times P_i}{hv} $$

where Iph [A] is the photocurrent, e [C] is the elementary charge, λ [m] is the wavelength of the incident light, QE [%] is the quantum efficiency, Pi[W] is the incident optical power, h [J.Hz−1] is Plank’s constant, and c [m.s−1] is the velocity of light in a vacuum. The quantity $E = \frac{hc}{\lambda} = h\nu$[eV] is the energy of a photon and ν [Hz] is the frequency of the photons. Formally, the quantum efficiency is determined by the ratio of the generated electrons Ne to the incident photons Nph within the photodetector :

$$QE = \frac{N_e}{N_{ph}} = \frac{\left(\frac{I_{ph}}{e}\right)}{\left(\frac{P_i}{h\nu}\right)} = R \times \left(\frac{h\nu}{e}\right)$$

where R [A/W] is the responsivity of the photodetector. Responsivity is very important because it relates the generated photocurrent Iph [A] with the impinged optical power Pi [W], e.g., R = Iph/Pi [A/W]. Hence, after acquiring the photocurrents, the primary physical quantity that was obtained is the responsivity. Subsequently, the quantum efficiency is derived from Equation (2)

Figure 4: Schematic cross-section of a CMOS image sensor 7)

Pixel types

Passive pixel sensor (PPS)

Active pixel sensor (APS)

3T-APS, 4T-APS 8)

Digital pixel sensor (DPS)

Types of illumination

Front side illmunation (FSI) and Bask side illumination (BI)

More for early sensors 9) Since its invention in 1993, CMOS image technology has evolved. The first architectures were front-illuminated, meaning the microlens and color filter were on top, followed by metal wiring for interconnects and the photodiode on the bottom. Since light enters the image sensor through the metal layers, some light information is reflected and lost before reaching the photodiode. This affected the performance of front-illuminated sensors, but Sony Corporation solved the problem by moving the photodiode to the top, next to the color filter. This architecture is known as the back-illuminated (BI) CMOS image sensor, which greatly improved the sensor’s performance.

Figure 5: Front-side vs back-side illumination 10)

Stacked Back-Illuminated

Current designs 11) Following the back illuminated sensor, the idea to stack the pixel and the logic circuit sections was proposed to reduce the size of the sensor in the X and Y directions. The pixel section containing the photodiodes was placed on the top and the logic circuitry was moved to the bottom of the architecture on the supporting substrate. This is called the Stacked Back-Illuminated CMOS Image Sensor, which was proposed by Sony Corporation in the year 2012.

Figure 6: Conventional vs stacked illuminated 12)

Color Filter Array (CFA)

In the popular Bayer color pattern (RGGB), each color “pixel” consists of a 2-by-2 array of photo-detectors where two are designated to green channel and each of the other two are for the blue and red channels, as shown in figure 4a.

https://www.emerald.com/sr/article-abstract/36/3/231/354088/Advances-on-CMOS-image-sensors?redirectedFrom=fulltext
Figure 7: Different color patterns 13)

Applications

Scientific applications

Public applications

Bibliography

Discussion

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